Dépôt numérique
RECHERCHER

Novel approach for the management of acid mine drainage (AMD) for the recovery of heavy metals along with lipid production by Chlorella vulgaris.

Brar, Kamalpreet Kaur; Etteieb, Selma; Magdouli, Sara; Calugaru, Laura et Brar, Satinder Kaur (2022). Novel approach for the management of acid mine drainage (AMD) for the recovery of heavy metals along with lipid production by Chlorella vulgaris. Journal of Environmental Management , vol. 308 . p. 114507. DOI: 10.1016/j.jenvman.2022.114507.

Ce document n'est pas hébergé sur EspaceINRS.

Résumé

The treatment of acid mine drainage (AMD) is of paramount importance for environmental sustainability. A two-stage process involving AMD remediation and simultaneous lipid production represents a highly efficient approach with zero-waste generation. Alkaline (NaOH) treatment of AMD at pH 8.0, 10.0, and 12.0 had significantly reduced metal loads (copper (Cu), cobalt (Co), chromium (Cr), cadmium (Cd), nickel (Ni), and zinc (Zn)) compared to the acidic pH range (4.0 and 6.0). The concentration levels of sulfates (SO₄ = 4520 mg/L), iron (Fe = 788 mg/L), aluminum (Al = 310 mg/L), and manganese (Mn = 19.4) were reduced to 2971 mg/L, 10.3 mg/L, 16.4 mg/L, and 1.3 mg/L, respectively at pH value 8.0. AMD with a pH value of 8.0 was later chosen as an ideal medium to favor the lipid accumulation by Chlorella vulgaris. Algal biomass was increasing to 5.5 g/L from 0.6 g/L of AMD-based medium within 15 days of cultivation. The FTIR and SEM-EDS studies revealed significant morphological changes in the microbial cell wall. The metals might positively impact lipid production in microalgae, where lipid yield achieved 0.18 g/g of glucose with lipid content of 0.35 g/g of biomass. The fatty acid profile presented 53.4% of saturated fatty acid content with a cetane value of 60.7. Thus, the efficiency of C. vulgaris was demonstrated with AMD treatment proving it to be a good candidate for bioenergy production.

Type de document: Article
Mots-clés libres: acid mine drainage (AMD); algal polishing; Chlorella vulgaris; lipid production; metal removal
Centre: Centre Eau Terre Environnement
Date de dépôt: 23 juin 2022 14:19
Dernière modification: 23 juin 2022 14:19
URI: https://espace.inrs.ca/id/eprint/12651

Gestion Actions (Identification requise)

Modifier la notice Modifier la notice