Dépôt numérique
RECHERCHER

Defect engineering of codoped visible light photosensitized TiO2:WN thin-films for efficient electro-photocatalysis.

Delegan, Nazar; Pandiyan, Rajesh; Teranishi, Takashi; Komtchou, Simon; Dirany, Ahmad; Drogui, Patrick ORCID logoORCID: https://orcid.org/0000-0002-3802-2729 et El Khakani, My Ali (2020). Defect engineering of codoped visible light photosensitized TiO2:WN thin-films for efficient electro-photocatalysis. Journal of Alloys and Compounds , vol. 833 . p. 155023. DOI: 10.1016/j.jallcom.2020.155023.

Ce document n'est pas hébergé sur EspaceINRS.

Résumé

La transcription des symboles et des caractères spéciaux utilisés dans la version originale de ce résumé n’a pas été possible en raison de limitations techniques. La version correcte de ce résumé peut être lue dans le document original.

Anionic doping, such as nitrogen doping is widely used to visible-light photosensitize TiO2. Unfortunately, this promotes the formation of oxygen vacancies (VO), reducing the per-photon efficiency of TiO2:N. Herein we propose a solution based on defect engineered acceptor-donor passivation of the electronic defects. This is achieved through the in-situ codoping of TiO2 by both W and N dopants, using an RF-magnetron sputtering deposition process. Compositional and structural analyses revealed that we were successful in incorporating both dopants in substitutional locations in the TiO2 lattice. Where nitrogen doping was confirmed to narrow the Eg of the material from 3.2 eV down to ∼2.3eV regardless of doping scheme. Most importantly, high frequency dielectric spectroscopy revealed that codoping greatly reduced VO concentrations, as tracked by their GHz dielectric contribution. Confirming the passivating interplay between both codopants. Finally, these optoelectronic improvements were shown to directly translate into threefold improved visible-light driven net-photocurrents.

Type de document: Article
Mots-clés libres: RF-magnetron sputtering; defect engineering; In-situ TiO₂ doping; bandgap engineering; electronic passivation; dopant dielectric spectroscop
Centre: Centre Eau Terre Environnement
Date de dépôt: 08 mars 2021 19:49
Dernière modification: 15 févr. 2022 16:33
URI: https://espace.inrs.ca/id/eprint/11422

Gestion Actions (Identification requise)

Modifier la notice Modifier la notice